Seamless ruthenium gap fill Patent Grant Kazem , et al. September 29, 2 [Applied Materials, Inc.]

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U.S. Patent Number 10790188 for Seamless ruthenium gap fill

US10755922B2 - Method for depositing silicon-free carbon-containing film as gap-fill layer by pulse plasma-assisted deposition - Google Patents

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Printwork EPU - Greige - Momentum Textiles and Wallcovering

Percept - Placid - 4040 - 26

PDF) presenting author Contact list

US10755922B2 - Method for depositing silicon-free carbon-containing film as gap-fill layer by pulse plasma-assisted deposition - Google Patents

Momentum: Beeline EPU Oat 1387626

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Reducing gate induced drain leakage in DRAM wordline Patent Grant Kang , et al. September 29, 2 [Applied Materials, Inc.]

Percept - Placid - 4040 - 26

US10755922B2 - Method for depositing silicon-free carbon-containing film as gap-fill layer by pulse plasma-assisted deposition - Google Patents